In high-end manufacturing industries such as semiconductor manufacturing, biopharmaceuticals, and precision electronics, the cleanliness of the production environment directly determines the quality and pass rate of the products. Even the tiniest dust particles or microbial contamination can lead to serious problems such as the scrapping of semiconductor chips and the failure of drug batches. This cleanroom-specific air filter is specially designed for the cleanroom environment in high-end manufacturing industries. With its ultimate filtration accuracy and stable performance, it provides clean air that meets strict standards for precision manufacturing processes, helping enterprises improve product quality and production efficiency.
The core advantage of this product lies in its extremely high filtration accuracy and stable purification performance. It adopts the most advanced international high-efficiency air filtration technology. The filter material is made of superfine glass fiber and PTFE membrane coating, with a filtration accuracy of 0.1 microns. The filtration efficiency for suspended particles, microorganisms and other pollutants in the air exceeds 99.99%. It fully meets the strict requirements of a Class 10 cleanroom in the semiconductor manufacturing industry (the number of particles with a diameter of ≥0.5 microns per cubic foot of air does not exceed 10).
To ensure the stability of filtration performance, strict quality control standards are adopted in the production process of filter materials. Each batch of filter materials is tested by a laser particle counter to ensure uniform and consistent filtration efficiency. The airflow resistance of the filter material has been optimally designed to ensure high filtration efficiency while keeping it at a low level, thus avoiding a decline in the ventilation efficiency of the clean room caused by the filtration system. In addition, the filter material has excellent chemical corrosion resistance and can adapt to the acidic and alkaline gas environments that may exist in the semiconductor manufacturing process, without causing a decline in filtration performance due to chemical corrosion.